为解决低光照环境下机器视觉采集图像存在的对比度低、细节丢失等问题，提出了一种基于扩展大气散射模型的低光照图像增强算法。首先，将低光照图像三个颜色通道的最大值作为初始传输图，并使用伽马校正调整图像的可见性和边缘细节；接着，利用融合技术优化初始传输图，融合不同方法提取的主要结构和精细结构；然后，利用亮通道的暗像素计算逆大气光值；最后，根据传输图和逆大气光值对模型进行求解得到最终增强图像。模型中的校正项可以更好地抑制增强图像的过度增强与细节丢失，同时，算法采用图像融合对传输图进行优化，可以较好地再现图像中的轮廓和纹理细节。实验结果表明，相比于其他8种算法，该算法在提高图像对比度、自然度和突出细节方面表现出了更好的性能。

Inverted perovskite solar cells (IPSCs) have attracted tremendous research interest in recent years due to their applications in perovskite/silicon tandem solar cells. However, further performance improvements and long-term stability issues are the main obstacles that deeply hinder the development of devices. Herein, we demonstrate a facile atomic layer deposition (ALD) processed tin dioxide (SnO₂) as an additional buffer layer for efficient and stable wide-bandgap IPSCs. The additional buffer layer increases the shunt resistance and reduces the reverse current saturation density, resulting in the enhancement of efficiency from 19.23% to 21.13%. The target device with a bandgap of 1.63 eV obtains open-circuit voltage of 1.19 V, short circuit current density of 21.86 mA/cm², and fill factor of 81.07%. More importantly, the compact and stable SnO₂ film invests the IPSCs with superhydrophobicity, thus significantly enhancing the moisture resistance. Eventually, the target device can maintain 90% of its initial efficiency after 600 h storage in ambient conditions with relative humidity of 20%–40% without encapsulation. The ALD-processed SnO₂ provides a promising way to boost the efficiency and stability of IPSCs, and a great potential for perovskite-based tandem solar cells in the near future.

Interface engineering has played an increasingly essential role in the development of perovskite solar cells (PSCs). Herein, we adopted an effective and simple one-step interface passivation method on a FA-based perovskite to fabricate efficient and stable planar PSCs. The surface defects are reduced by the perovskite interface passivation layer incorporated between the hole transport and perovskite absorber layers, and then non-radiative recombination is suppressed while interfacial carrier extraction is enhanced. The passivated planar PSCs demonstrates 20.83% power conversion efficiency (PCE), which is caused by the simultaneous enhancement of the fill factor and open-circuit voltage. In addition, the device also shows great ambient and thermal stability. It retains 94% of its original PCE after 1000 h under ambient air without encapsulation as well as 90% of its initial efficiency after 400 h under continuous heating at 65 °C with encapsulation. This research provides a strategy for the development of efficient and stable PSCs.

化学气相沉积法是制备大尺寸、高质量石墨烯的有效方法, 其中金属催化剂的性能直接关系到所制备的石墨烯材料的品质, 因此需对金属催化剂进行表面预处理。本文研究了不同的预处理工艺对常用的铜基底催化剂表面状态的影响, 提出了钝化膏酸洗和电化学抛光协同处理的有效方法, 并对电化学抛光工艺参数(抛光电压、时间)以及铜基底退火工艺(退火温度、时间)等进行了系统研究。研究表明: 电化学抛光电压过高、抛光时间过长容易导致过度抛光, 合适的抛光电压和抛光时间分别为8 V和8 min。退火温度和时间对铜催化剂表面晶粒形态影响较大, 经1000 ℃退火处理30 min后, 铜箔表面晶粒尺寸更大, 分布更均匀。此外, 对CVD法生长制备的石墨烯样品进行表征, 电镜图片和拉曼光谱显示, 获得的石墨烯薄膜的层数较少, 且结构缺陷较少。